Citations made to U.S. granted patents by U.S. patents granted in 2022

Specific WIPO fields: [ Computer technology  |  Digital communication  |  Electrical machinery, apparatus, energy  |  Measurement  |  Audio-visual technology  |  Medical technology  |  Optics  |  Transport  |  Semiconductors  |  Telecommunications  |  Other special machines  |  Pharmaceuticals  |  Organic fine chemistry  |  Mechanical elements  |  Chemical engineering  |  Engines, pumps, turbines  |  Civil engineering  |  Control  |  Basic materials chemistry  |  Handling  |  Furniture, games  |  Machine tools  |  Biotechnology  |  Other consumer goods  |  Macromolecular chemistry, polymers  |  IT methods for management  |  Textile and paper machines  |  Basic communication processes  |  Surface technology, coating  |  Materials, metallurgy  |  Environmental technology  |  Thermal processes and apparatus  |  Analysis of biological materials  |  Food chemistry  |  Micro-structural and nano-technology ]

Thin Film Deposition: A significant focus is on techniques for depositing thin films, including chemical vapor deposition (CVD), atomic layer deposition (ALD), and physical vapor deposition (PVD). These techniques are essential for creating advanced materials with tailored properties for various applications.

Material Science: The development of new materials and coatings is a major theme, with patents covering materials like titanium nitride, zirconium oxide, and metal silicides. These materials offer improved properties such as hardness, corrosion resistance, and thermal conductivity.

Manufacturing Processes: Patents related to manufacturing processes, such as etching, lithography, and wafer processing, are also prominent. These processes are critical for producing high-quality semiconductor devices and other electronic components.

Surface Modification: Patents covering surface modification techniques, such as plasma treatment and ion implantation, are also important. These techniques can be used to improve the surface properties of materials, such as adhesion, wear resistance, and corrosion resistance.

Overall, the top cited patents in surface technology and coating highlight the importance of advanced materials and manufacturing processes in enabling the development of innovative products and technologies. These advancements are driving progress in various industries, including electronics, automotive, and aerospace.

#surfacetechnology #coating #thinfilms #materialscience #manufacturing #semiconductors #innovation #technology

  1. 7 9017481    Process feed management for semiconductor substrate processing
  Inventors:  Fred Pettinger; Carl White; Dave Marquardt; Sokol Ibrani; Eric Shero; Todd Dunn; Kyle Fondurulia; Mike Halpin

  2. 5 5500256    Dry process apparatus using plural kinds of gas
  Inventors:  Masahiro Watabe

  2. 5 6565661    High flow conductance and high thermal conductance showerhead system and method
  Inventors:  Tue Nguyen

  2. 5 8506713    Film deposition apparatus and film deposition method
  Inventors:  Toshio Takagi

  5. 4 10974324    Coated cutting tool
  Inventors:  Kinya Takahashi; Naoyuki Fukushima

  5. 4 3977083    Dental instrument
  Inventors:  Norman Leslie; Ben A. Otsap

  5. 4 4034135    Rigid structure
  Inventors:  Michael Edward Anthony Passmore

  5. 4 4357382    Coated cemented carbide bodies
  Inventors:  John B. Lambert; Mortimer Schussler

  5. 4 4932094    Liquid applicator tool
  Inventors:  Peter D. McCowin

  5. 4 4973511    Composite solar/safety film and laminated window assembly made therefrom
  Inventors:  Peter H. Farmer; Stanley S. Ho; Raymond F. Riek; Floyd E. Woodard

  5. 4 5217561    Laminating apparatus
  Inventors:  Noriyoshi Ueda; Kimiaki Hayakawa

  5. 4 5298136    Steered arc coating with thick targets
  Inventors:  Subbiah Ramalingam

  5. 4 5415753    Stationary aperture plate for reactive sputter deposition
  Inventors:  Steven D. Hurwitt; Israel Wagner

  5. 4 5950925    Reactant gas ejector head
  Inventors:  Yukio Fukunaga; Hiroyuki Shinozaki; Kiwamu Tsukamoto; Masao Saitoh

  5. 4 5979078    Cushioning device for a footwear sole and method for making the same
  Inventors:  Ross A. McLaughlin

  5. 4 6080446    Method of depositing titanium nitride thin film and CVD deposition apparatus
  Inventors:  Ryoki Tobe; Yasuaki Tanaka; Atsushi Sekiguchi; Hitoshi Jimba; So Won Kim

  5. 4 6106625    Reactor useful for chemical vapor deposition of titanium nitride
  Inventors:  Keith Koai; Mark Johnson; Mei Chang; Lawrence Chung Lei

  5. 4 6409832    Protein crystallization in microfluidic structures
  Inventors:  Bernhard H. Weigl; Jurgen Sygusch

  5. 4 6589209    Safety syringe with retraction trunk
  Inventors:  Edward D. Dysarz

  5. 4 6893521    Double-side lamination system
  Inventors:  Naotaka Sasaki; Shunichi Kawamata; Kenji Sugaya; Hideaki Ito

  5. 4 7946326    Automatic sheet laminating apparatus and automatic sheet laminating method
  Inventors:  Bin-Tao Lee; Jiang-Wei Wu; Xiao-Xiong Wei

  5. 4 8778079    Chemical vapor deposition reactor
  Inventors:  Michael J. Begarney; Frank J. Campanale

  1. 56 7754621    Process for producing zirconium oxide thin films
  Inventors:  Matti Putkonen

  2. 54 8956971    Selective formation of metallic films on metallic surfaces
  Inventors:  Suvi P. Haukka; Antti Niskanen; Marko Tuominen

  3. 53 10014212    Selective deposition of metallic films
  Inventors:  Shang Chen; Toshiharu Watarai; Takahiro Onuma; Dai Ishikawa; Kunitoshi Namba

  3. 53 9129897    Metal silicide, metal germanide, methods for making the same
  Inventors:  Viljami J. Pore; Suvi P. Haukka; Tom E. Blomberg; Eva E. Tois

  3. 53 9455138    Method for forming dielectric film in trenches by PEALD using H-containing gas
  Inventors:  Atsuki Fukazawa; Hideaki Fukuda; Noboru Takamure; Masaru Zaitsu

  3. 53 9895715    Selective deposition of metals, metal oxides, and dielectrics
  Inventors:  Suvi P. Haukka; Raija H. Matero; Eva Tois; Antti Niskanen; Marko Tuominen; Hannu Huotari; Viljami J. Pore; Ivo Raaijmakers

  7. 52 7084060    Forming capping layer over metal wire structure using selective atomic layer deposition
  Inventors:  Toshiharu Furukawa; Steven J. Holmes; David V. Horak; Charles W. Koburger, III

  7. 52 7611751    Vapor deposition of metal carbide films
  Inventors:  Kai-Erik Elers

  7. 52 9786491    Formation of SiOCN thin films
  Inventors:  Toshiya Suzuki; Viljami J. Pore

References:
Raw data from: U.S. Patent and Trademark Office. "Data Download Tables." PatentsView. Accessed September 7, 2024. https://patentsview.org/download/data-download-tables.

Please contact me (carlos@candeloro.net) for methodology, or if you know or believe information presented is not correct.